Organic EL panel

ABSTRACT

The present invention is to ensure that when it has been judged that film-formation areas of a plurality of layers laminated on the same luminescent areas of organic EL devices involve a defect, it is possible to exactly find which layer of the multi-laminated layers is a defective layer. The film formation areas of layers to be laminated on luminescent area are formed in a manner such that overlap deviations e 1 -e 3  are intentionally formed.

CROSS-REFERENCE TO RELATED APPLICATION

This is a Divisional Application of U.S. patent application Ser. No.:12/252,983, filed Oct. 16, 2008, which is a Divisional Application ofU.S. patent application Ser. No.: 11/083,017, filed Mar. 18, 2005, nowU.S. Pat. No. 7,659, 660, Issued Feb 09, 2010, which claims the benefitof priority from Japanese Patent Application No. 2004-083076, filed Mar.22, 2004. The disclosures of the prior applications are herebyincorporated in their entirety by reference.

BACKGROUND OF THE INVENTION

This invention relates to an organic EL (Electroluminescence) panel anda method of manufacturing the same.

The present application claims priority from Japanese Application No.2004-083076, the disclosures of which are incorporated herein byreference.

An organic EL panel is produced by forming surface emission elementswhich are organic EL devices (elements) on a substrate, and forming adisplaying area by arranging one or more organic EL devices. Eachorganic EL device is mounted on a substrate and comprises a firstelectrode, an organic layer including one or more layers of organiccompound materials containing at least one organic luminescent layer,and a second electrode, thereby forming a structure with the organiclayer interposed between a pair of electrodes.

In such an organic EL panel, film formation areas of layers (such asorganic layer) essential for organic EL device (s) are formedcorresponding to single or a group of luminescent areas (which may bepixels if display is dot matrix display) to be formed on a substrate.For example, if it is desired to effect light emission of differentcolors in luminescent area units in order to effect a color display, itis necessary for material layers related to light emission colors to beformed by different materials in different light emission units.However, in forming films in luminescent area units, it is also possibleto select luminescent areas on which film formation is performed usingan identical material, by employing a film formation mask having apattern indicating many openings corresponding to selected luminescentareas, thereby forming film formation areas corresponding to theselected luminescent areas by virtue of mask pattern.

On the other hand, in order to improve luminescent performance and toensure various luminescent colors for organic EL devices, theabove-mentioned organic layer and electrode layers are sometimesrequired to be formed into multi-layered structures. At this time, theforegoing film formation mask is employed to form laminated layers inthe film formation areas corresponding to luminescent areas.

For example, Japanese Unexamined Patent Application Publication Hei2002-367787 discloses an organic EL panel shown in FIG. 1A. As shown, onone surface of a substrate 1 there are formed a plurality of firstelectrodes 2 consisting of a transparent conductive material such asITO. A plurality of insulating films 3 are arranged to cover the exposedportions (between every two adjacent first electrodes 2) of thesubstrate 1 as well as part of the periphery of each first electrode 2,thereby dividing the substrate into a plurality of small sections andthus forming a plurality of luminescent areas 45R, 45G, and 45B on thefirst electrodes 2. Then, a hole injection layer 40 and a holetransporting layer 41 are formed to cover the first electrodes andspaces therebetween, while areas 60R, 60G, and 60B are selectedcorresponding to different colors, followed by forming in the respectiveareas luminescent layers 42R, 42G, and 42B, electron transporting layers43R, 43G, and 43B, and electron injection layers 44R, 44G, and 44B.Finally, second electrodes 50 are formed over these layers.

In this way, the luminescent layers 42R, 42G, and 42B, the electrontransporting layers 43R, 43G, and 43B, and the electron injection layers44R, 44G, and 44B together form the afore-mentioned organic layer in anorganic EL panel, thus constituting film formation areas correspondingto the luminescent areas 45R, 45G, and 45B.

In the above-discussed prior art, if only single one luminescent area isconsidered, since the luminescent layer, the electron transportinglayer, and an electron injection layer are formed using an identicalpattern of the same film formation mask, it is preferred that the formedthree layers are overlapped one upon another without any overlapdeviation. However, since the film formation mask and the substrate haveto be positioned relatively to each other for forming each film layer,some troubles in positioning operation will occur and thus filmformation area in a certain specific layer will suffer a considerableoverlap deviation, resulting in a film formation failure.

Usually, it is supposed that various film formation errors will occur ina film formation process using a film formation mask, so that thepattern of a film formation mask should be set such that the length andwidth of film formation area are somewhat longer than the length andwidth of luminescent area. However, as shown in FIG. 1B, if a certainspecific layer b of laminated layers a-c is deviated from its filmformation area and thus located away from a luminescent area s, troublewill occur in the luminescent state of the luminescent area s. As aresult, such film formation is usually considered as a film formationfailure which must be removed.

Usually, a film formation failure can be detected by an eye-inspectionusing a microscope or through an image processing. If an inspected stateis like that shown in FIG. 1B, it is possible to judge that such a stateis a film formation failure. However, it is extremely difficult to judgewhich layer among the laminated layers has been greatly deviated andthus is a defective layer. On the other hand, in a process ofmanufacturing an organic EL panel, once a film formation failure occursat a certain step, similar failures will probably occur in later steps.Accordingly, it is extremely important to detect a specific layer inwhich a film formation failure has occurred, to re-check a filmformation process for forming the specific layer, so as to improve theyield of manufacturing process.

SUMMARY OF THE INVENTION

The present invention has been accomplished to solve the above-discussedproblem and it is an object of the invention to provide an improvedorganic EL panel comprising a substrate and organic EL devices (eachformed by interposing an organic layer containing an organic luminescentlayer between a pair of electrodes) formed on the substrate, and toprovide a method of manufacturing the improved organic EL panel, so thatwhen it is judged that film formation areas of a plurality of layerslaminated on an identical luminescent area of an organic EL panelinvolves a film formation failure, it is possible to determine whichlayer among the laminated layers involves the film formation failure.

In order to achieve the above objects, an organic EL panel and itsmanufacturing method according to the present invention arecharacterized by at least the following aspects.

According to one aspect of the present invention, there is provided animproved organic EL panel having a substrate and organic EL devicesformed on the substrate, each organic EL device including a pair ofelectrodes, an organic layer interposed between the pair of electrodes,with the organic layer being formed by laminating a plurality of filmlayers including an organic luminescent layer. In particular, filmformation areas of a plurality of layers which are essential for formingorganic EL devices and laminated on identical luminescent areas of theorganic EL devices are formed to have overlap deviations which can beused to identify each of the plurality of film layers.

According to another aspect of the present invention, there is providedan improved method of manufacturing an organic EL panel having asubstrate and organic EL devices formed on the substrate, each organicEL device including a pair of electrodes, an organic layer interposedbetween the pair of electrodes, with the organic layer being formed bylaminating a plurality of film layers including an organic luminescencefunctional layer. The method comprises a film formation step in whichfilm formation areas of layers which are essential for forming organicEL devices are formed on luminescent areas of the organic EL devicescorresponding to the pattern of a film formation mask having a pluralityof openings. Further, in the film formation step, overlap deviationswhich can be used to identify each of the plurality of film layers, areformed on the film formation areas of several layers laminated on anidentical luminescent area.

BRIEF DESCRIPTION OF THE DRAWINGS

These and other objects and advantages of the present invention willbecome clear from the following description with reference to theaccompanying drawings, wherein:

FIGS. 1A and 1B are explanatory views showing a prior art;

FIGS. 2A and 2B are explanatory views showing an organic EL panel formedaccording to an embodiment of the present invention;

FIGS. 3A and 3B are explanatory views showing masks for use inmanufacturing organic EL panel according to an embodiment of the presentinvention;

FIGS. 4A and 4B are flow charts showing a method of manufacturingorganic EL panel according to an embodiment of the present invention;

FIG. 5 is an explanatory view showing one embodiment of the presentinvention; and

FIG. 6 is an explanatory view showing another embodiment of the presentinvention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

A preferred embodiment of the present invention will be described belowwith reference to the accompanying drawings. FIGS. 2A and 2B areexplanatory views showing an organic EL panel formed according to oneembodiment of the present invention. As shown, an organic EL panelobtained in a predetermined film formation process has film formationareas on a plurality of layers a, b, and c laminated on an identicalluminescent area s of the organic EL panel. After film formation, it ispossible to observe film formation states shown in FIGS. 2A and 2B byusing a microscope or through an image processing. Here, the pluralityof layers a, b, and c are all essential elements for forming organic ELdevices and serving as unit surface emission elements of the organic ELpanel, and can act as various layers forming an organic layer(containing an organic luminescent functional layer) or act as electrodelayers.

In the organic EL panel according to the present embodiment of thepresent invention, the film formation areas a-c are formed in a mannersuch that they are overlapped by one another and mutually deviated(overlap and overlap deviation) so as to be distinguishable from oneanother. Here, “overlap deviation” means an “off-set amount.” Namely, asshown in FIG. 2A, the film formation area of layer b deviates e1, fromthe film formation area of layer a, the film formation area of layer cdeviates e2, from the film formation area of layer b and deviates e3,from the film formation area of layer a. Although the present embodimentillustrated in FIG. 2A shows that the overlap deviations of the layersare in the same direction, the present invention is by no means to belimited by such specific example. Actually, the overlap deviations ofthe layers are allowed to be in different directions, provided thatdifferent layers are distinguishable from one another. Further, althoughthe present embodiment illustrated in FIG. 2A shows that three layersa-c are overlapped by one another and mutually deviated, it is alsopossible to form “overlap deviation” with all layers laminated on theluminescent area s, or with at least two layers selected from theselayers, thereby making it possible to distinguish these layers from oneanother.

As mentioned above, film formation area of each layer to be formedcorresponding to the luminescent area s is usually set larger than theluminescent area s by having an extra portion in length and widthdirections. Therefore, an amount of the above-mentioned overlapdeviation can be set by making use of such extra portions. Namely, asshown in FIG. 2A, the length La of the film formation area of the layera is set longer than the length Ls of the luminescent area s, therebysetting the overlap deviation amounts e1-e3, within the range of such anextra portion. Further, in order to form recognizable overlapdeviations, it is preferable that extra portions (as compared with theluminescent area s) of layers a-c be set large in overlap deviationdirections, thus increasing each of the overlap deviations e1-e3. Morepreferably, the overlap deviations e1-e3, are set larger than estimatedoverlap deviation amounts caused due to film formation errors, so as toensure that the overlap deviations e1-e3, set in advance will not becomeunrecognizable due to film formation errors (such as mask positioningerror, mask designing error, and deposition error).

FIG. 2A shows an appropriate film formation state in which therespective layers a-c can cover the luminescent area s. On the otherhand, FIG. 2B shows that a certain layer b has deviated from theluminescent area s and film formation at this time can be judged as afilm formation failure. At this time, since the above-described overlapdeviations e1-e3, are formed, it is possible to judge that layer b is afilm formation failure. In this way, by reviewing a step of forminglayer b and searching out a cause responsible for the film formationfailure, it is possible to prevent subsequent film formation steps fromsimilar troubles.

Moreover, since the above-described overlap deviations are formed in theaforementioned lamination order in the same direction, it is possible toeffectively recognize the respective layers.

Namely, when the film formation areas are to be laminated on theluminescent area s in the order of layers a, b, c, an operationnecessary at this time is only to successively form these overlapdeviations in their lamination order in the longitudinal direction, asshown in FIG. 2A. Therefore, if layer b is a film formation failure,such layer can be detected by judging in accordance with such overlapdeviation order. However, the direction in which these overlapdeviations are formed should not be limited to the longitudinaldirection (y direction) shown in FIG. 2A. Actually, the above-describedoverlap deviations can also be arranged in the lateral direction (xdirection) or in a rotated direction θ.

In fact, the present embodiment of the present invention can beeffectively applied to an example in which the film formation areas areformed by an identical pattern of a single film formation mask. At thistime, the above-described overlap deviations maybe formed byintentionally deviating the position of the film formation mask at thetime of forming each layer. However, the present invention should not belimited to such a specific example. Actually, it is also possible to usea film formation mask having a common pattern capable of forming filmformation areas on the respective layers, or to form a pattern (capableof intentionally forming the above-described overlap deviations) on eachfilm formation mask.

A film formation mask used in the present invention can be in anydesired pattern. For example, it is possible to use a film formationmask M₁, having a stripe-like pattern containing linear openings Ma₁,shown in FIG. 3A. Further, it is also possible to use another filmformation mask M₂, having an alternate pattern containing openings Ma₂,corresponding to a group of luminescent areas, as shown in FIG. 3B.

FIGS. 4A and 4B are flow charts briefly showing a method of forming anorganic EL panel according to one embodiment of the present invention.In fact, the method of forming an organic EL panel according to thepresent invention is almost the same as a conventional method (includingpre-processing step S1→film formation step S2→sealing step S3→inspectionstep S4, as shown in FIG. 4A,), with only the film formation step S2being different from a conventional one. In film formation step S2, whenfilm formation areas of layers forming an organic EL device arelaminated on the luminescent area s of the organic EL devicecorresponding to the pattern of a film formation mask, recognizableoverlap deviations (for example, overlap deviations e1-e3) are formed ona plurality of layers (for example, layers a-c) to be formed on theidentical luminescent area s. Subsequently, a sealing step S3 isperformed and an inspection step S4 is thus carried out to perform aneye-inspection or an image-processing on a film formation state of thefilm formation areas.

In the film formation step S2, film formation is performed by usingvarious materials. However, when laminating layers having an identicalpattern (corresponding to the luminescent area) on the luminescent areas, a film formation mask is set (Sm1) as a first step, and then a firstlayer of film is formed, followed by repeating the film formation (Smn,Snn). Then, if necessary, other layers of films are formed, therebyfinishing the film formation step. At this time, when setting the filmformation mask (Sm1, Sm2, . . . , Smn), the setting position of the filmformation mask is shifted intentionally, thereby forming theabove-described overlap deviations.

The amounts of the overlap deviations at this time, as described above,are set such that an amount of overlap deviation of each layer is largerthan an estimated overlap deviation possibly caused by an film formationerror, while a maximum overlap deviation amount is set in a manner suchthat each film formation area will not go beyond the luminescent area s(some extra areas or free margins are formed between the luminescentarea s and each film formation area of the layers a-c).

According to the method of manufacturing the organic EL panel of thepresent embodiment of the present invention (as described above), it ispossible to effectively detect a film formation failure during aneye-inspection or an image processing inspection to be performed afterthe film formation, without having to add some other additional steps ascompared with a conventional process except that the film formation maskis set in the manner as described above.

Next, description will be given to explain, as an embodiment of thepresent invention, an organic EL panel having linearly arrangedluminescent areas containing three colors of RGB. In detail, a filmformation mask is used which has a stripe-like pattern including aplurality of linear openings, and linear areas of several film layersare formed on the luminescent area by painting different colors ondifferent liner areas.

FIG. 5 is an explanatory view (a cross sectional view) showing thestructure of an organic EL panel 100 formed according to the presentembodiment. As shown, the organic EL panel 100 is formed by interposingan organic layer 4 containing an organic luminescent layer between firstelectrodes 2 on one hand and second electrodes 5 on the other, therebyforming a plurality of organic EL devices 10 on the substrate 1. In anexample shown in FIG. 5, a silicone coating layer 1 a, is formed on thesubstrate 1, and a plurality of first electrodes 2 consisting oftransparent electrode material such as ITO and serving as cathodes areformed on the silicon coating layer 1 a. Further, second electrodes 5consisting of a metal and serving as anodes are formed above the firstelectrodes 2, thereby forming a bottom emission type panel producinglight from the substrate 1 side. Moreover, the panel also contains anorganic layer 4 including a hole transporting layer 4A, a luminescentlayer 4B, and an electron transporting layer 4C. Then, a cover 6 isbonded to the substrate 1 through an adhesive layer 7, thereby forming asealing space M on the substrate 1 and thus forming a display sectionconsisting of organic EL devices 10 within the sealing space M.

In the example shown in FIG. 5, the organic EL devices 10 are formedsuch that the first electrodes 2 are separated by a plurality ofinsulating strips 3, thereby forming luminescent units (10R, 10G, 10B)under the first electrodes 2. Moreover, a desiccant layer 6A is attachedto the inner surface of the cover 6, thereby preventing the organic ELdevices 10 from getting deteriorated due to moisture.

Moreover, along the edge of the substrate 1 there is formed a firstelectrode layer 8A using the same material and the same step as formingthe first electrodes 2, which is separated from the first electrodes 2by the insulating strips 3. Further, on the lead-out portion of thefirst electrode layer 8A there is formed a second electrode layer 8Bcontaining a silver alloy and forming a low-resistant wiring portion. Inaddition, if necessary, a protection coating layer 8C consisting of IZOor the like is formed on the second electrode layer 8C. In this way, alead-out electrode 8 can be formed which consists of the first electrodelayer 8A, the second electrode layer 8B, and the protection coating 8C.Then, an end portion 5 a, of each second electrode 5 is connected to thelead-out electrode 8 within the sealing space M.

Here, although the lead-out electrode of each first electrode 2 is notshown in the drawing, it is possible to elongate each first electrode 2and lead the same out of the sealing space M. Actually, such lead-outelectrode can also be formed into an electrode layer containing Ag alloyor the like and constituting a low resistant wiring portion.

In the organic EL panel 100 of the present embodiment, since therespective layers (the hole transporting layer 4A, the luminescent layer4B, and the electron transporting layer 4C) of the organic layer 4 arepainted with different colors, it is possible to form film formationareas corresponding to the luminescent units 10R, 10G, and 10B. Here,although the present embodiment shows an organic layer 4 having athree-layer structure, the present invention should not be limited bythree-layer structure. In fact, it is possible to form a structureincluding, from the anode side, a hole injection layer (common to RGB)/afirst hole transporting layer (common to RGB)/a second hole transportinglayer (painted with different colors)/a first organic luminescent layer(painted with different colors)/a second organic luminescent layer(painted with different colors)/a first electron transporting layer(painted with different colors)/a second electron transporting layer(common to RGB)/an electron-injection layer (common to RGB)/(cathode).At this time, four layers including the second hole transporting layer,the first organic luminescent layer, the second organic luminescentlayer, and the first electron transporting layer, all painted withdifferent colors, are formed as film formation areas corresponding tothe luminescent units 10R, 10G and 10B, on the luminescent units 10R,10G, and 10B.

Then, as shown in FIG. 6, with the layers to be painted with differentcolors, film formation areas of layers laminated on the same luminescentunits 10R (10G, 10B), are formed to have overlap deviations fordistinguishing one layer from another. In other words, the respectivefilm formation areas of the hole transporting layer 4A, the luminescentlayer 4B, and the electron transporting layer 4C are formed on alinearly arranged area covering a plurality of linearly arrangedluminescent units R. On the other hand, several overlap deviations e1,e2, and e3, are formed along the longitudinal direction (y direction) ofthe linear area. Further, in forming the film formation areas, it isallowed to use the film formation mask M₁, having a pattern including aplurality of linear openings M_(a1), shown in FIG. 3A, whereas theposition of the film formation mask M₁, is successively shifted for eachlayer along the longitudinal direction of the opening M_(a1).

Further, as shown in FIG. 6, when linearly arranging the luminescentunits 10R (10G, 10B) of the same color to form a linear film formationarea, it is possible to form each film formation area with a relativelylarge extra portion in the longitudinal direction (y direction) of theluminescent unit 10R (10G, 10B), thereby making it possible toeffectively form the above-described overlap deviations e1, e2, and e3in y direction.

The present embodiment makes it possible to obtain the same effect asobtainable from the above-described embodiment. Namely, when a filmformation failure is judged during an inspection performed after thefilm formation, it is possible to detect which layer contains such filmformation failure by virtue of the overlap deviations e1-e3. In thisway, by checking the film formation step which has produced a layercontaining the film formation failure and searching out a causeresponsible for the film formation failure, it is possible to preventany similar trouble during subsequent film formation steps.

Next, description will be given to explain in detail the organic ELpanel 100 and the method of manufacturing the same, according to oneembodiment of the present invention.

a. Electrodes

Either the first electrodes 2 or the second electrodes 5 are set ascathode side, while the opposite side is set as anode side. The anodeside is formed by a material having a higher work function than thecathode side, using a transparent conductive film which may be a metalfilm such as chromium (Cr), molybdenum (Mo), nickel (nickel), andplatinum (Pt), or a metal oxide film such as ITO and IZO. In contrast,the cathode side is formed by a material having a lower work functionthan the anode side, using a metal having a low work function, which maybe an alkali metal (such as Li, Na, K, Rb, and Cs), an alkaline earthmetal (such as Be, Mg, Ca, Sr, and Ba), a rare earth metal, a compoundor an alloy containing two or more of the above elements, or anamorphous semiconductor such as a doped polyaniline and a dopedpolyphenylene vinylene, or an oxide such as Cr₂O₃, NiO, and Mn₂O₅.Moreover, when the first electrodes 2 and the second electrodes 5 areall formed by transparent materials, it is allowed to provide areflection film on one electrode side opposite to the light emissionside.

The lead-out electrodes (the lead-out electrode 8 and the lead-outelectrode of the first electrodes 2) are connected with drive circuitparts driving the organic EL panel 100 or connected with a flexiblewiring board. However, it is preferable for these lead-out electrodes tobe formed as having a low resistance. Namely, the lead-out electrodescan be formed by laminating low resistant metal electrode layers whichmay be Ag, Cr, Al, or their alloys, or may be formed by single oneelectrode of low resistant metal.

b. Organic layer

Although the organic layer 4 comprises one or more layers of organiccompound materials including at least one organic luminescent layer, itslaminated structure can be in any desired arrangement. Usually, as shownin FIG. 5, there is a laminated structure including, from the anode sidetowards the cathode side, a hole transporting layer 4A, a luminescentlayer 4B, and an electron transporting layer 4C. Each of the holetransporting layer 4A, the luminescent layer 4B, and the electrontransporting layer 4C can be in a single-layer or a multi-layeredstructure. Moreover, it is also possible to dispense with the holetransporting layer 4A and/or the electron transporting layer 4C. On theother hand, if necessary, it is allowed to insert other organic layersincluding a hole injection layer, an electron injection layer and acarrier blocking layer. Here, the hole transporting layer 4A, theluminescent layer 4B, and the electron transporting layer 4C can beformed by any conventional materials (it is allowed to use either a highmolecular material or a low molecular material).

With regard to a luminescent material for forming the luminescent layer4B, it is allowed to make use of a luminescence (fluorescence) when thematerial returns from a singlet excited state to a base state or aluminescence (phosphorescence) when it returns from a triplet excitedstate to a base state through a singlet base state.

c. Covering Member (Covering Film)

Further, the organic EL panel according to the present invention is apanel formed by tightly covering organic EL devices 10 with a coveringmember 6 made of metal, glass, or plastic. Here, the covering member maybe a piece of material having a recess portion (a one-step recess or atwo-step recess) formed by pressing, etching, or blasting.Alternatively, the covering member may be formed by using a flat glassplate and includes an internal covering space M to be formed between theflat glass plate and the support substrate by virtue of a spacer made ofglass (or plastic). In practice, the internal covering space may eitherbe an air-tight space or can be filled with a filler such as a highmolecular elastomer, resin or silicon oil.

In order to tightly seal the organic EL devices 10, it is also possiblefor the covering member 6 to be replaced by a sealing film to cover theorganic EL devices 10. The covering film can be formed by laminating asingle layer of protection film or a plurality of protection films, andis allowed to be formed by either an inorganic material or an organicmaterial. Here, an inorganic material may be a nitride such as SiN, AlN,and GaN, or an oxide such as SiO, Al₂O₃, Ta₂O₅, ZnO, and GeO, or anoxidized nitride such as SiON, or a carbonized nitride such as SiCN, ora metal fluorine compound, or a metal film, etc. On the other hand, anorganic material may be an epoxy resin, or an acryl resin, or aparaxylene resin, or a fluorine system high molecule such as perfluoroolefin and perfluoro ether, or a metal alkoxide such as CH₃OM andC₂H₅OM, or a polyimide precursor, or a perylene system compound, etc. Inpractice, the above-mentioned lamination and material selection can becarried out by appropriately designing the organic EL devices.

d. Adhesive Agent

An adhesive agent forming the adhesive layer 7 may be a thermal-settingtype, a chemical-setting type (2-liquid mixture), or a light(ultraviolet) setting type, which can be formed by an acryl resin, anepoxy resin, a polyester, a polyolefine. Particularly, it is preferableto use an ultraviolet-setting epoxy resin adhesive agent which is quickto solidify without a heating treatment.

e. Desiccating Material

Desiccating material 6A may be a physical desiccating agent such aszeolite, silica gel, carbon, and carbon nanotube; a chemical desiccatingagent such as alkali metal oxide, metal halogenide, peroxide chlorine; adesiccating-agent formed by dissolving an organic metallic complex in apetroleum system solvent such as toluene, xylene, an aliphatic organicsolvent and the like; and a desiccating agent formed by dispersingdesiccating particles in a transparent binder such as polyethylene,polyisoprene, polyvinyl thinnate.

f. Various Types of Organic EL Display Panels

The organic EL panel 100 of the present invention can have various typeswithout departing from the scope of the invention. For example, theorganic EL panel 100 can have a passive drive type based on an electrodearrangement shown in FIG. 5, as well as an active drive type capable ofTFT driving each organic EL device 10 acting as a luminescent unit.Further, the light emission type of an organic EL device 10 can be abottom emission type emitting light from the substrate 1 side, or a topemission type emitting light from a side opposite to the substrate 1.Moreover, the EL display panel may be a single color display or amulti-color display. In practice, in order to form a multi-color displaypanel, it is allowed to adopt a discriminated painting method or amethod in which a single color (white or blue) luminescence functionallayer is combined with a color conversion layer formed by a color filteror a fluorescent material (CF method, CCM method), a photographbreeching method which realizes a multiple light emission by emitting anelectromagnetic wave or the like to the light emission area of a singlecolor luminescent functional layer, or SOLED (transparent Stacked OLED)method in which two or more colors of unit display areas are laminatedto form one unit display area.

g. Example of Manufacturing Method

A thin film of ITO or the like is formed on a glass-substrate 1 throughvapor deposition, sputtering or the like, and formed into a desiredpattern though photolithography or the like, thereby forming a pluralityof first electrodes 2. Further, patterning is performed to forminsulating films 3 and allow the openings of the luminescent units 10R,10G, 10B to be connected with the first electrodes 2 (pre-processingstep S1).

Next, an organic layer 4 is formed by a wet process such as spincoating, dipping, screen printing, ink jet printing and the like, or adry process such as vapor-deposition, Laser-Induced-Thermal-Imaging(LITI), and the like. In detail, a hole transporting layer 4A, aluminescent layer 4B, and an electron transporting layer 4C aresuccessively laminated on the luminescent units 10R, 10G, 10B throughvapor deposition.

On such occasion, a coating method utilizing a film-formation mask isused to coat film layers with different colors. Thus, materialspresenting light emissions of three colors RGB or a composite materialconsisting of several organic substances, are formed into film formationareas corresponding to the luminescent units RGB. At this time, thefilm-formation mask is set in a manner such that the aforementionedoverlap deviations may be formed. In addition, if film formation of onelayer in one luminescent area is carried out twice or more utilizing thesame material, it is possible to avoid an incomplete film within theluminescent area. Finally, the second electrodes 5 consisting of metalfilm and serving as cathodes are formed into strips orthogonal to thefirst electrodes 2, thereby forming organic EL devices 10 in a dotmatrix array on the orthogonal intersections of the first electrodes andthe second electrodes (film formation step S2).

Subsequently, spacers (preferably, made of glass or plastic) having aparticle size of 1-300 μm are mixed at an appropriate ratio (0.1, to0.5, weight %) into an amount of ultraviolet-setting epoxy resinadhesive so as to obtain an adhesive agent, which is then applied to anadhesive agent-coating area on the substrate 1, utilizing a dispenser orthe like. Further, in an atmosphere of an inert gas such as argon gas, acovering member 6 is bonded to the substrate 1 through the adhesiveagent, followed by irradiating such adhesive agent with an ultravioletlight so as to harden the same. In this way, it is possible to cover theorganic EL devices 10 with an inert gas such as argon gas containedwithin a covering space between the covering member 6 and the substrate1 (covering step S3).

Then, defective products will be detected and eliminated through aninspection step (S4) which can be an eye-observation using a microscope,an image processing or the like, thereby obtaining an organic EL panelsas a final product.

According to the above-discussed embodiment or example of the presentinvention, once it has been judged that film formation areas of aplurality of layers laminated on the same luminescent area of an organicEL panel involves a defect, it is possible to find which layer of themulti-laminated layers involves such a defect. In this way, by checkingthe film-forming process which has produced such defective layer, it ispossible to prevent same film-forming defect from occurring later, so asto improve the reliability of the organic EL panel, and to improve theproduction yield, thereby reducing the production cost.

In addition, the above-described embodiment or example of the presentinvention can be utilized not only for detecting, as mentioned above, acertain defective film layer, but also for measuring the film thicknessof a specific layer.

While there has been described what are at present considered to bepreferred embodiments of the present invention, it will be understoodthat various modifications may be made thereto, and it is intended thatthe appended claims cover all such modifications as fall within the truespirit and scope of the invention.

What is claimed is:
 1. An organic EL panel having a substrate andorganic EL devices formed above the substrate, each organic EL deviceincluding a pair of electrodes, a plurality of organic layers beinginterposed between the pair of electrodes, wherein: the organic EL panelis an active drive type capable of TFT driving each organic EL device;the organic EL panel is a top emission type emitting light from a sideopposite to the substrate; luminescent units for the organic EL devicesare linearly arranged by color; film formation areas for which theplurality of organic layers are formed are arranged on the luminescentunits; and each of the film formation areas for a color covers theluminescent units for the color.
 2. The organic EL panel according toclaim 1, wherein overlap deviations are formed on the film formationareas to identify each of the plurality of organic layers.
 3. Theorganic EL panel according to claim 2, wherein the overlap deviationsare formed along an arrangement direction of the luminescent units forthe color.
 4. The organic EL panel according to claim 3, wherein each ofthe film formation areas is formed in a same pattern.
 5. The organic ELpanel according to claim 4, wherein the overlap deviations are formed onan end of a longitudinal direction of the film formation areas.
 6. Theorganic EL panel according to claim 5, wherein the overlap deviationsare formed on both ends of the longitudinal direction of the filmformation areas.
 7. The organic EL panel according to claim 6, whereinthe film formation areas are linearly arranged, corresponding to theluminescent units linearly arranged for each of three colors, R, G andB.